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Thin Film, Plasma, and Surface Analysis

Mass Spectrometers for Thin Films, Plasma & Surface Engineering

Thin Films Plasma

Hiden Analytical have been designing and developing the highest quality quadrupole mass spectrometer based systems for over 30 years. We have built a reputation for delivering instruments with superior sensitivity, accuracy and reproducibility together with a first class global service and applications support network.

Thin film processing in research, development and functionalization of surfaces has a broad application range in microelectronics, nanotechnology, solar, flat panel, mechanics, optics, photonics, textiles, coatings, chemistry, biology and medicine.

Thin film processing utilises a wide range of techniques, including:

  • Magnetron sputtering
  • ALD – Atomic Layer Deposition
  • CVD – Chemical Vapour Deposition
  • MOCVD – Metal Organic Chemical Vapour Deposition
  • PECVD – Plasma Enhanced Chemical Vapour Deposition
  • MBE – Molecular Beam Epitaxial growth
  • RIE – plasma Reactive Ion Etch
  • IBE/RIBE – Ion Beam Etch and Reactive Ion Beam Etch

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