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Ion Beam Products

XIAD – 1kW Ion Source

Telemark 1kW Ion Source
XIAD 1kW Ion Source

The XIAD Gridless End-Hall Ion Source has been specially developed to provide a cost effective solution for ion assisted processes for small to medium sized deposition systems. The XIAD provides an extremely reliable and maintenance-free 1kW source for many applications in PVD processes. The compact design and rugged construction allows easy installation to both new and existing vacuum deposition systems.

ST55 – 1.5kW Ion Source

ST55 Ion Source
ST55 Ion Source

The ST55 Gridless End-Hall Ion Source has been specially developed to provide a cost effective solution for ion assisted vacuum processes for medium to large sized deposition systems. The ST55 provides an extremely reliable and maintenance-free 1.5kW source for many applications in PVD processes.
The compact design and rugged construction allows easy installation to both new and existing vacuum deposition systems.

ST3000 – 3kW Ion Source

Telemark ST3000 - 3kW Ion Source
ST3000 3kW Ion Source

The ST3000 Gridless End-Hall Ion Source has been specially developed to provide a cost effective solution for ion assisted vacuum processes for medium to large sized deposition systems. The ST3000 provides an extremely reliable and maintenance-free 3kW sourcefor many applications in PVD processes.
The compact design and rugged construction allows easy installation to both new and existing vacuum deposition systems.

Ion Current Monitor

Ion Current Monitor
Ion Current Monitor

The Telemark/Saintech Ion Current Monitor (ICM) provides REAL TIME Monitoring of Ion Flux throughout ion assisted deposition processes.

The Ion Current Monitor provides essential deposition information for most ion-based process. The ICM monitors the flux of positive ions and outputs the beam current in units of amps per square centimeter. Three amplifier ranges are provided to adequately cover the flux density output from a wide range of commercially available ion beam sources. An adjustable bias voltage is provided to reject negatively charged particles (electrons).